Single-Wafer SPIN ETCH

This Single-Wafer Spin Etch machine is suitable for etching of substrates.

Alteration right reservation to introduce improvements

  • High-precision, program-controlled etching of substrates
  • Accurate positioning of the spray arms
  • Fully automatic as well as manual positioning of the spray arms
  • For a wide range of applications (edge etching, residue / photoresist removal etc.)
  • Flexible for your specific application

Options on request