Single-Wafer SPIN ETCH
This Single-Wafer Spin Etch machine is suitable for etching of substrates.
Dimensions
Alteration right reservation to introduce improvements
Technical data
- High-precision, program-controlled etching of substrates
- Accurate positioning of the spray arms
- Fully automatic as well as manual positioning of the spray arms
- For a wide range of applications (edge etching, residue / photoresist removal etc.)
- Flexible for your specific application
Accessories
Options on request
