Cleaning & Etching
Cleaning – for perfectly clean surfaces
DI-H2O · SC1: NH4OH:H2O:H2O · SC2: HCl:H2O2:H2O · DHF · BOE · Piranha: H2SO4:H2O2 · Acetone · IPA · HCl, HF, HNO3 , NH4F, NH4OH, H2O2, H2SO4 · Hot DI-H2O · Tenside · etc.
RAMGRABER offers you equipment for excellent wafer cleaning. Whether manual, semi-automatic or fully-automatic – each of our systems for your cleaning processes convinces through excellent removal of organic and inorganic contaminations.
A high throughput and realization in approved RAMGRABER quality – that ́s what you can expect from RAMGRABER systems.
Etching – for homogeneous, reproducible etching results
H3PO4:HNO3:H2O · HF:HNO3:CH3COOH · HF:HNO3:H2O · HCl:HNO3 · TiWN · KOH · NaOH · TMAH · SC1 · SC2 · DHF · BOE · HF · Piranha · etc.
Whether as batch process or as spin spray machine – RAMGRABER etching equipment produces homogeneous, reproducible etching results and needs only low media consumption.
On demand you can also get the etching equipment with necessary media supply/ disposal systems. Then RAMGRABER is your competent partner for your whole etching system.
Cleaning: Features & Advantages
goods agitation systems: vertical / horizontal / combined
ultrasonic: 25kHz / 40 kHz / multiple-frequencies etc.
megasonic: 1 MHz / megasonic spraying nozzles etc.
rinsing system: overflow rinse, quick dump rinse, hot DI-Water rinse, cascade rinse, megasonic-quick dump rinse etc.
further: spray under emmersion, top spray, movable spray nozzles, N2 Bubbling, ph value measurement etc.
Your Advantages
- excellent removal of organic and inorganic contaminations
- sophisticated exhaust configuration
- innovative control and monitoring of media
- safe media conditioning
- maximum bath life time via spiking / feed&bleed
Etching: Options & Advantages
Possible Options
Fully automatic process: control connection to the MES/CAM via SECS/GEM or customer-specific interface, logfiles, etc.
Accurate and quick transfer: < 1 sec.
High temperature technique: > 150 °C
Chemical systems: Supply / mixing / disposal stations
Compliant configuration: FM 4910
Your Advantages
- defined etching rate
- optimized media flow
- temperature stability
- sophisticated exhaust configuration
- innovative control and monitoring of media
- safe media conditioning
- maximum bath life time via spiking / feed&bleed
